Paper
2 June 2004 Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z
Rainer Plontke, Lutz Bettin, Dirk Beyer, Joerg Butschke, Mathias Irmscher, Corinna Koepernik, Bernd Leibold, Armelle B. E. Vix, Peter Voehringer
Author Affiliations +
Proceedings Volume 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2004) https://doi.org/10.1117/12.568033
Event: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2004, Dresden, Germany
Abstract
The aim is to apply e-beam lithography for second level imaging of Alternating Phase Shift Masks (altPSM) in the 65 nm node and below. Difficulties due to charging effects arise when exposing areas where the chromium absorber has been cleared away. In order to achieve correct pattern placement, the commercial water-soluble conductive ESPACER 300Z top coat from Showa Denka is applied in combination with chemically amplified resist of type FEP171. The paper describes the method and algorithm to test the efficacy of the material and the technological steps taken to avoid or reduce charge effects. The obtained overlay accuracy proves the ESPACER/FEP171 combination a promising approach for future altPSM manufacturing.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Plontke, Lutz Bettin, Dirk Beyer, Joerg Butschke, Mathias Irmscher, Corinna Koepernik, Bernd Leibold, Armelle B. E. Vix, and Peter Voehringer "Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z", Proc. SPIE 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (2 June 2004); https://doi.org/10.1117/12.568033
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Cited by 2 patents.
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KEYWORDS
Quartz

Chromium

Thin film coatings

Electron beam lithography

Photomasks

Distortion

Optical inspection

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