Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

Rainer Pforr; Wolfgang Dettmann; M. Eisenhut; Mario Hennig; Detlef Hofmann; Joerg Thiele; Guido Thielscher

doi:10.1117/12.568032

2 June 2004 Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

Rainer Pforr, Wolfgang Dettmann, M. Eisenhut, Mario Hennig, Detlef Hofmann, Joerg Thiele, Guido Thielscher

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Proceedings Volume 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2004) https://doi.org/10.1117/12.568032
Event: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2004, Dresden, Germany

Abstract

Contact layers of the DRAM manufacturing process can be printed well using alternating phase-shifting masks. State-of-the-art mask making tools have sufficient performance to manufacture defect free contact masks. The enlarged process window compared to conventional masks allows to shrink the contacts size or to substitute advanced scanners by older generation steppers for contact layer patterning. Using older generation exposure systems may cause problems originating in worse lens aberration performance. A method will be described how to overcome overlay problems by applying a specifically designed OL measurement target.

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Rainer Pforr, Wolfgang Dettmann, M. Eisenhut, Mario Hennig, Detlef Hofmann, Joerg Thiele, and Guido Thielscher "Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation", Proc. SPIE 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (2 June 2004); https://doi.org/10.1117/12.568032

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