Fast MTF measurement of CMOS imagers at the chip level using ISO 12233 slanted-edge methodology

Magali Estribeau; Pierre Magnan

doi:10.1117/12.565503

4 November 2004 Fast MTF measurement of CMOS imagers at the chip level using ISO 12233 slanted-edge methodology

Magali Estribeau, Pierre Magnan

Proceedings Volume 5570, Sensors, Systems, and Next-Generation Satellites VIII; (2004) https://doi.org/10.1117/12.565503
Event: Remote Sensing, 2004, Maspalomas, Canary Islands, Spain

Abstract

MTF measurement methods for imaging devices usually require the use of an optical system to project the image of the object onto the detector. So, MTF results quality strongly depends on the accuracy of the optical adjustments (alignments, focusing...). Dedicated edge patterns have been implemented at the chip level on a CMOS imager. One of them emulates the target used in the ISO 12233 slanted-edge technique and the others one are inspired by the knife-edge method. This allows to get the MTF data without optical focusing. In order to validate the results, comparisons have been made between MTF measurements using these patterns and results obtained through direct measurements with the transmissive slanted-edge target and sine target.

Citation Download Citation

Magali Estribeau and Pierre Magnan "Fast MTF measurement of CMOS imagers at the chip level using ISO 12233 slanted-edge methodology", Proc. SPIE 5570, Sensors, Systems, and Next-Generation Satellites VIII, (4 November 2004); https://doi.org/10.1117/12.565503

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