Photonic systems formed by proximity field nanopatterning

Seokwoo Jeon; Gary P. Wiederrecht; John A. Rogers

doi:10.1117/12.597652

22 January 2005 Photonic systems formed by proximity field nanopatterning

Seokwoo Jeon, Gary P. Wiederrecht, John A. Rogers

Proceedings Volume 5720, Micromachining Technology for Micro-Optics and Nano-Optics III; (2005) https://doi.org/10.1117/12.597652
Event: MOEMS-MEMS Micro and Nanofabrication, 2005, San Jose, California, United States

Abstract

High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.

Citation Download Citation

Seokwoo Jeon, Gary P. Wiederrecht, and John A. Rogers "Photonic systems formed by proximity field nanopatterning", Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); https://doi.org/10.1117/12.597652

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