Paper
7 July 2005 Laser irradiation, ion implantation, and e-beam writing of integrated optical structures
Author Affiliations +
Proceedings Volume 5840, Photonic Materials, Devices, and Applications; (2005) https://doi.org/10.1117/12.609231
Event: Microtechnologies for the New Millennium 2005, 2005, Sevilla, Spain
Abstract
Much attention is currently being paid to the materials and processes that allow one to directly write or to imprint waveguiding structures and/or diffractive elements for optical integrated circuits by exposure from a source of photons, electrons or ions. Here a brief overview of the results achieved in our laboratories is presented, concerning the fabrication and characterization of optical guiding structures based on different materials and exposure techniques. These approaches include: electron and ion beam writing of waveguides in (poly)-crystalline lithium fluoride, uv-laser printing of waveguides and gratings in photorefractive glass thin films, and fs-laser writing in tellurite glasses. Properties and perspectives of these approaches are also discussed.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Giancarlo C. Righini, I. Banyasz, S. Berneschi, M. Brenci, A. Chiasera, M. Cremona, D. Ehrt, M. Ferrari, R. M. Montereali, G. Nunzi Conti, S. Pelli, S. Sebastiani, and C. Tosello "Laser irradiation, ion implantation, and e-beam writing of integrated optical structures", Proc. SPIE 5840, Photonic Materials, Devices, and Applications, (7 July 2005); https://doi.org/10.1117/12.609231
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Cited by 12 scholarly publications.
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KEYWORDS
Laser induced fluorescence

Glasses

Waveguides

Crystals

Integrated optics

Channel waveguides

Ions

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