High-power pulsed CO<sub>2</sub> laser for EUV lithography

Tatsuya Ariga; Hideo Hoshino; Taisuke Miura; Akira Endo

doi:10.1117/12.656804

24 March 2006 High-power pulsed CO₂ laser for EUV lithography

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, Akira Endo

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61513M (2006) https://doi.org/10.1117/12.656804
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Laser produced plasma is the candidate for high quality, 115 W EUV light source for the next generation lithography. Cost effective laser driver is the key requirement for the realization of the concept as a viable scheme. A CO₂ laser driven LPP system with a Xenon or Tin droplet target, is therefore a promising light source alternative. We are developing a high power and high repetition rate CO₂ laser system to achieve 10 W intermediate focus EUV power. High conversion efficiency (CE) from the laser energy to EUV in-band energy, is the primarily important issue for the concept to be realized. Experimental and numerical simulation analysis of a Xenon plasma target shows that a short laser pulse less than 15 ns is necessary to obtain high CE by a CO₂ laser. This paper describes on the development of a CO₂ laser system with a short pulse length less than 15 ns, a nominal average power of a few kW, and a repetition rate of 100 kHz based on RF-excited, axial flow CO₂ laser amplifiers. Output power of 1 kW has been achieved with a pulse length 15 ns at 100 kHz repletion rate in a small signal amplification condition. The phase distortion during the amplification is negligible and the beam is focused down to 100μm diameter onto a fast Xenon jet. The conceptual design of the CO₂ laser system for LPP EUV light source, and amplification performance in short pulse using RF-excited axial flow laser as amplifiers, are reported. Additional approach to increase the amplification efficiency is discussed.

Citation Download Citation

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, and Akira Endo "High-power pulsed CO₂ laser for EUV lithography", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513M (24 March 2006); https://doi.org/10.1117/12.656804

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