Paper
14 November 2007 Time-resolved dynamics of 355-nm laser-irradiated surface damage on fused silica
Shizhen Xu, Xiaodong Yuan, Wanguo Zheng, Xiaotao Zu, Haibin Lv, Xiaodong Jiang, Haijun Wang, Jin Huang
Author Affiliations +
Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67220M (2007) https://doi.org/10.1117/12.782853
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China
Abstract
The dynamics of 355-nm laser ablation on fused silica were studied by instantaneous scattering pulse measurement and a time-resolved shadowgraph imaging. The sharp increase of scattered light of pumped pulse is assumed to be the damage precursor, therefore, the damage start nearly at the peak of the pumped pulse. The plasmas flash due to ion-electron recombination occurred about 21ns after the peak of pumped pulses. The propagating shock wave and ejected material to the air were imaged by shadowgraphic technology. The damage process of fused silica under UV laser ablation was also discussed.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shizhen Xu, Xiaodong Yuan, Wanguo Zheng, Xiaotao Zu, Haibin Lv, Xiaodong Jiang, Haijun Wang, and Jin Huang "Time-resolved dynamics of 355-nm laser-irradiated surface damage on fused silica", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67220M (14 November 2007); https://doi.org/10.1117/12.782853
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KEYWORDS
Silica

Laser scattering

Plasmas

Light scattering

Laser ablation

Scattering

Ultraviolet radiation

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