Slope-integrated methodology for OPC model calibration

Liang Zhu; Mark Lu; Dion King; Yili Gu; Steve Yang; Gensheng Gao

doi:10.1117/12.755663

21 November 2007 Slope-integrated methodology for OPC model calibration

Liang Zhu, Mark Lu, Dion King, Yili Gu, Steve Yang, Gensheng Gao

Author Affiliations +

Proceedings Volume 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography; 682725 (2007) https://doi.org/10.1117/12.755663
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

As the semiconductor industry scales down to 90nm and below, Model-Based OPC has become a standard practice to compensate for optical proximity effects and process variations occurring when printing features below the exposure wavelength. For parametric OPC models, it is assumed that the empirical data are accurate and the model parameter space is sufficiently well sampled. In spite of advanced metrology tools, the measurement uncertainty for 1D small critical dimensions and 2D patterns remains to be a challenge. Traditionally, the weight of SEM measurement points are based on either statistical method such as standard deviations, or engineers' judgment, which is either time consuming or individual-dependent. In this paper, the slope-integrated OPC model calibration methodology is proposed, which takes into account the slope as a weighting indicator. The additional measurement objects per calibration structure are economically feasible, as most metrology tool time is spent on addressing and auto-focusing. When we consider one measurement point with both CD and slope measurements, the slightly increased time is tolerable for FAB, which requires a short turn around time (TAT). By this approach, we can distinguish measurement points with low confidence from those accurate ones. Furthermore, we check the fitting differences among equal-weighted data sheets, empiricalweighted data sheets and slope-weighted data sheets, by using the same variable threshold model form. From the edge placement error (EPE) of fitting results and the overlap between simulated contours and SEM images, it is found that the proposed slope-integrated methodology results in a more accurate and stable model.

Citation Download Citation

Liang Zhu, Mark Lu, Dion King, Yili Gu, Steve Yang, and Gensheng Gao "Slope-integrated methodology for OPC model calibration", Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 682725 (21 November 2007); https://doi.org/10.1117/12.755663

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Optical proximity correction

Data modeling

Calibration

Scanning electron microscopy

Metrology

Time metrology

Critical dimension metrology

Show All Keywords

Keywords/Phrases

Search In:

Publication Years