Properties of Au/Pt/Ti contact to p-InP by rapid thermal processing

Yanqiu Lv; Hengjing Tang; Bing Han; Xiaoli Wu; Kefeng Zhang; Xue Li; Haimei Gong

doi:10.1117/12.756554

8 January 2008 Properties of Au/Pt/Ti contact to p-InP by rapid thermal processing

Yanqiu Lv, Hengjing Tang, Bing Han, Xiaoli Wu, Kefeng Zhang, Xue Li, Haimei Gong

Proceedings Volume 6835, Infrared Materials, Devices, and Applications; 68350D (2008) https://doi.org/10.1117/12.756554
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

We found that the contact resistance of Au/Pt/Ti on p-InP increases with the increase of annealing time and annealing temperature. Au/Pt/Ti is ohmic contact metal as deposited with specific contact resistance of 2.49×10^-3 Ωcm² when p-InP doped by 7.5×10¹⁸ cm^-3 and is Schottky contact when doped by 2×10¹⁸ cm^-3. Surface morphologies of Au/Pt/Ti after rapid thermal processing (RTP) were analyzed by atom force microscopy (AFM). An interface layer dominated by TiIn compound, which increase the specific contact resistance, was found in Auger electron spectroscopy (AES) analysis. P-InP and n-InP ohmic contacts can be achieved at the same time as deposited when added p-In_0.53Ga_0.47As layer on p-InP/InGaAs/n-InP without annealing.

Citation Download Citation

Yanqiu Lv, Hengjing Tang, Bing Han, Xiaoli Wu, Kefeng Zhang, Xue Li, and Haimei Gong "Properties of Au/Pt/Ti contact to p-InP by rapid thermal processing", Proc. SPIE 6835, Infrared Materials, Devices, and Applications, 68350D (8 January 2008); https://doi.org/10.1117/12.756554

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