Recent developments in UV laser micromachining

R. Delmdahl; Rainer Pätzel

doi:10.1117/12.781962

21 February 2008 Recent developments in UV laser micromachining

R. Delmdahl, Rainer Pätzel

Proceedings Volume 6874, High Energy/Average Power Lasers and Intense Beam Applications II; 68740K (2008) https://doi.org/10.1117/12.781962
Event: Lasers and Applications in Science and Engineering, 2008, San Jose, California, United States

Abstract

Stable, high energy excimer lasers providing pulsed output energies ranging from 100 mJ up to over 1000 mJ in the ultraviolet region with photon energies as high as 5 eV (248 nm), 6.3 eV (193 nm) or 7.9 eV (157 nm) lend maximum flexibility to laser microprocessing, since virtually every material is amenable to accurate, high resolution material ablation without subsequent cleaning. Due to the UV photons provided with no up-conversion required as direct output by excimer lasers, output powers of many hundred watts are easily achievable and are key to high throughput, and up-scaling capability of manufacturing processes. Most important for reproducible production results is a temporally and spatially stable behavior of consecutive laser pulses as well as utmost lateral homogeneity of the on-sample energy density (fluence). These requirements constitute the superiority of excimer lasers over other pulsed UV laser sources such as lamp-pumped Nd:YAG lasers. Pulse-to-pulse stabilities of less than 1 %, rms as easily provided by excimer laser systems which cannot be achieved with frequency converted Nd:YAG. Laser systems. In particular, the large flat-top excimer laser profile is well-suited for most efficient parallel processing of two and three dimensional microstructures. Spectral properties, temporal pulse and laser beam parameters of state of the art UV excimer lasers and beam delivery systems will be compared with frequency converted, flash-lamp pumped Nd:YAG lasers.

Citation Download Citation

R. Delmdahl and Rainer Pätzel "Recent developments in UV laser micromachining", Proc. SPIE 6874, High Energy/Average Power Lasers and Intense Beam Applications II, 68740K (21 February 2008); https://doi.org/10.1117/12.781962

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