Line length scalable high power diode laser with power densities > 100kw/cm2 for industrial Si-annealing applications

Markus Revermann; Andreas Bayer; Jens Meinschien

doi:10.1117/12.762956

26 February 2008 Line length scalable high power diode laser with power densities > 100kw/cm² for industrial Si-annealing applications

Markus Revermann, Andreas Bayer, Jens Meinschien

Author Affiliations +

Proceedings Volume 6879, Photon Processing in Microelectronics and Photonics VII; 68790R (2008) https://doi.org/10.1117/12.762956
Event: Lasers and Applications in Science and Engineering, 2008, San Jose, California, United States

Abstract

We present newly developed high power diode laser modules which are performing at outstanding power densities and line uniformity. The combination of recently designed laser diode bars on passive heat sinks and optimized micro-optics results to laser modules with power densities > 100kW/cm² in a line length of 12mm x 0.1mm. The usage of non periodic structured homogenizers leads to a homogeneity of less than 3% p/v which allows precise heating and annealing applications. The application for such laser lines are hardening, metallization and annealing of different materials. In the presentation we will show results of thin film Si-a annealing process with direct diode laser annealing.

Citation Download Citation

Markus Revermann, Andreas Bayer, and Jens Meinschien "Line length scalable high power diode laser with power densities > 100kw/cm² for industrial Si-annealing applications", Proc. SPIE 6879, Photon Processing in Microelectronics and Photonics VII, 68790R (26 February 2008); https://doi.org/10.1117/12.762956

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