Paper
15 February 2008 Industrial ultrafast internal engraving laser system for anti-counterfeiting applications
Eric Mottay, Axel Kupisiewicz, Gerard Detroux, Xavier Costet, Adrian Simmons, Ulisse Vivarelli, Philippe Lemaire, John Lopez
Author Affiliations +
Abstract
We report on an industrial ultrafast laser system for internal marking and engraving of transparent materials. Current engraving techniques, using nanosecond infrared or UV laser, are either limited to surface marking, or create thermal stress which can lead to fracture of material. Using an infrared ultrafast laser, we describe an industrial equipment able to non-aggressively mark alphanumeric or datamatrices at a high speed, with a high readability. Anti-counterfeiting and normative applications will be presented, as well as integration on a production line.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric Mottay, Axel Kupisiewicz, Gerard Detroux, Xavier Costet, Adrian Simmons, Ulisse Vivarelli, Philippe Lemaire, and John Lopez "Industrial ultrafast internal engraving laser system for anti-counterfeiting applications", Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 68810H (15 February 2008); https://doi.org/10.1117/12.761189
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Laser engraving

Laser marking

Glasses

Laser applications

Laser systems engineering

Femtosecond phenomena

Ultrafast lasers

RELATED CONTENT


Back to Top