High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography

Kenneth E. Gonsalves; Mingxing Wang; Narahari S. Pujari

doi:10.1117/12.770458

26 March 2008 High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography

Kenneth E. Gonsalves, Mingxing Wang, Narahari S. Pujari

Author Affiliations +

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231P (2008) https://doi.org/10.1117/12.770458
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The objective of to develop high refractive index (HRI) chemical amplified resists (CAR), which are composed of HRI photoacid generator (PAG) bound polymer resists, and incorporate HRI nanoparticles into the polymer matrix. Therefore, this new series of nanocomposite resists should be effective for 193 nm immersion lithography with high RI, to obtain feature sizes down to 32 nm or lower.

Citation Download Citation

Kenneth E. Gonsalves, Mingxing Wang, and Narahari S. Pujari "High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231P (26 March 2008); https://doi.org/10.1117/12.770458

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