Road to a zero degree total temperature range post exposure bake process

Tobias Wähler; Peter Dress

doi:10.1117/12.801369

17 October 2008 Road to a zero degree total temperature range post exposure bake process

Tobias Wähler, Peter Dress

Proceedings Volume 7122, Photomask Technology 2008; 71220C (2008) https://doi.org/10.1117/12.801369
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

With tighter CD uniformity requirements, a tighter temperature control during a Post Exposure Bake (PEB) process for photomask production becomes more and more important. CD non uniformities can be partially ascribed to deficiencies of the measurement devices used for the process qualification of a PEB hotplate system. In this paper, a new routine is proposed to overcome the deficiencies of the measurement devices used, so that further improvement of the hotplate performance becomes possible. Using a 25 point sensor array, we finally achieved a bake performance of the hotplate system described in terms of "real" total temperature range on the mask surface, of 0.4°C during temperature ramp-up and below 0.1°C at steady state for a final mean temperature of 100°C. This is a first step in the right direction towards a temperature range of zero for the bake process.

Citation Download Citation

Tobias Wähler and Peter Dress "Road to a zero degree total temperature range post exposure bake process", Proc. SPIE 7122, Photomask Technology 2008, 71220C (17 October 2008); https://doi.org/10.1117/12.801369

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