E-beam exposure system using multi column cell (MCC) with CP for mask writing

Akio Yamada; Hiroshi Yasuda; Masaki Yamabe

doi:10.1117/12.801564

17 October 2008 E-beam exposure system using multi column cell (MCC) with CP for mask writing

Akio Yamada, Hiroshi Yasuda, Masaki Yamabe

Proceedings Volume 7122, Photomask Technology 2008; 71220K (2008) https://doi.org/10.1117/12.801564
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

In the Mask D2I project at ASET, the authors designed a novel electron beam exposure system using the concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam) to improve the throughput of electron beam exposure systems. They presented outlines of a proof-of-concept system of MCC, and have shown the performances of VSB and CP in the system. They evaluated the impacts on beam position in one column cell caused by deflections in another column cell. The impacts were found to be less than 0.1nm in presence of major deflections in the neighboring column cell. Hence it was concluded that there was no noticeable impact on deflections cause by the neighboring column cells in the MCC system.

Citation Download Citation

Akio Yamada, Hiroshi Yasuda, and Masaki Yamabe "E-beam exposure system using multi column cell (MCC) with CP for mask writing", Proc. SPIE 7122, Photomask Technology 2008, 71220K (17 October 2008); https://doi.org/10.1117/12.801564

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