Paper
11 November 2008 Micro-ring resonators fabricated by focused-ion-beam on SOI
Author Affiliations +
Proceedings Volume 7136, Optical Transmission, Switching, and Subsystems VI; 71362G (2008) https://doi.org/10.1117/12.803132
Event: Asia-Pacific Optical Communications, 2008, Hangzhou, China
Abstract
We present the fabrication of high Q factor micro-ring resonators on SOI substrate by directly focused-ion-beam (FIB) milling. Micro-ring resonators with diameters of 10 μm and 80 μm are fabricated and their corresponding intrinsic Q factors are 4,000 and 130,000, respectively.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jie Tian and Min Qiu "Micro-ring resonators fabricated by focused-ion-beam on SOI", Proc. SPIE 7136, Optical Transmission, Switching, and Subsystems VI, 71362G (11 November 2008); https://doi.org/10.1117/12.803132
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KEYWORDS
Resonators

Waveguides

Silicon

Microrings

Thermal oxidation

Ions

Silica

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