The noble resists composed of cationic and anionic polymerizable PAGs

Jung Hoon Oh; Dong Chul Seo; Hyun Sang Joo; Sung Do Jung; Jin Ho Kim; Seung Jae Lee; Ran Ra Park; JoonHee Han; Joo Hyeon Park

doi:10.1117/12.804631

4 December 2008 The noble resists composed of cationic and anionic polymerizable PAGs

Jung Hoon Oh, Dong Chul Seo, Hyun Sang Joo, Sung Do Jung, Jin Ho Kim, Seung Jae Lee, Ran Ra Park, JoonHee Han, Joo Hyeon Park

Author Affiliations +

Proceedings Volume 7140, Lithography Asia 2008; 714031 (2008) https://doi.org/10.1117/12.804631
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

A recent new class of resists referred to as polymer-bound PAG resists, which have slightly increased PAG loading and reduced photo acid diffusion relative to tranditional blended CAR systems have shown promise in improving resolution, faster photospeed, higher stablility and LER. we have developed two kinds of PAG, which are cationic and anionic polymerizable PAGs. One is that the polymer backbone is directly connected with cationic part in PAG and the other is that the polymer backbone is directly connected with anionic part in PAG. In this study we described the synthetic process of polymerizable PAGs and the polymerization process to make PAG-bound polymers and then, the lithography properties of resists composed of PAG-bound polymer were reffed to.

Citation Download Citation

Jung Hoon Oh, Dong Chul Seo, Hyun Sang Joo, Sung Do Jung, Jin Ho Kim, Seung Jae Lee, Ran Ra Park, JoonHee Han, and Joo Hyeon Park "The noble resists composed of cationic and anionic polymerizable PAGs", Proc. SPIE 7140, Lithography Asia 2008, 714031 (4 December 2008); https://doi.org/10.1117/12.804631

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