Polysilane optical waveguide devices using photo-bleaching effect

Soichi Kobayashi; Toshihiro Suda; Takumi Ishiguro; Daiki Motoyoshi; Yoshiaki Yamabayashi

doi:10.1117/12.811790

10 February 2009 Polysilane optical waveguide devices using photo-bleaching effect

Soichi Kobayashi, Toshihiro Suda, Takumi Ishiguro, Daiki Motoyoshi, Yoshiaki Yamabayashi

Proceedings Volume 7219, Optoelectronic Integrated Circuits XI; 721907 (2009) https://doi.org/10.1117/12.811790
Event: SPIE OPTO: Integrated Optoelectronic Devices, 2009, San Jose, California, United States

Abstract

The polysilane optical waveguide fabrications by using photo-bleaching technology with the UV lamp and the UV laser direct drawing technologies are reported. The characteristics of the 1xN optical waveguide splitters and the semiconductor tunable lasers (STLs) with polymer tunable external resonators are presented. An average propagation loss of the straight waveguide was less than 0.7dB/cm at 1550 nm. PDL was measured less than 0.5 dB in the case of 1×8 splitter. The insertion loss of 1×4 splitter patterned by laser drawing method was measured less than 7.5 dB/cm. In the STLs the external resonator consists of a singlemode polysilane waveguide and a Bragg grating filter. The power ratio between main and side modes was over 30 dB. Laser power was measured as 5.6 mW at 70% reflective index of the Bragg grating.

Citation Download Citation

Soichi Kobayashi, Toshihiro Suda, Takumi Ishiguro, Daiki Motoyoshi, and Yoshiaki Yamabayashi "Polysilane optical waveguide devices using photo-bleaching effect", Proc. SPIE 7219, Optoelectronic Integrated Circuits XI, 721907 (10 February 2009); https://doi.org/10.1117/12.811790

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