Novel resist for replica preparation of mold for imprint lithography

Daisaku Matsukawa; Hiroyuki Wakayama; Kazuyuki Mitsukura; Haruyuki Okamura; Yoshihiko Hirai; Masamitsu Shirai

doi:10.1117/12.813383

1 April 2009 Novel resist for replica preparation of mold for imprint lithography

Daisaku Matsukawa, Hiroyuki Wakayama, Kazuyuki Mitsukura, Haruyuki Okamura, Yoshihiko Hirai, Masamitsu Shirai

Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 72730T (2009) https://doi.org/10.1117/12.813383
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Two types of dimethacrylate which have hemiacetal ester moiety in a molecule were synthesized from difunctional vinyl ethers and methacrylic acid. UV curing of the monomers and photo-induced degradation of the UV cured resins were investigated. On UV irradiation at 365 nm under N₂ atmosphere, these dimethacrylates containing 2,2-dimethoxy-2-phenylacetophenone and triphenylsulfonium triflate became insoluble in methanol. The UV cured resins degraded if acids were generated in the system. Present resins were applied to make a plastic replica of mold for imprint lithography and the plastic replica was prepared in good form. The effect of imprint conditions on volume shrinkage of methacrylates was investigated. Dimethacrylate that has adamantyl unit showed a low-shrinkage property.

Citation Download Citation

Daisaku Matsukawa, Hiroyuki Wakayama, Kazuyuki Mitsukura, Haruyuki Okamura, Yoshihiko Hirai, and Masamitsu Shirai "Novel resist for replica preparation of mold for imprint lithography", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72730T (1 April 2009); https://doi.org/10.1117/12.813383

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