Paper
11 May 2009 Two-fluid cleaning technology for advanced photomask
Tsutomu Kikuchi, Nobuo Kobayashi, Yoshiaki Kurokawa, Harumichi Hirose, Mikio Nonaka
Author Affiliations +
Abstract
Along with the increased miniaturization of electronic devices, two-fluid cleaning technology is garnering the spotlight as a solution for the manufacturing process of Photomask. This is because it is now known that implementing energy control of the particles that are sprayed on the substrate allows cleaning of miniature patterns. However, it is not yet clear just how miniature of a pattern is cleanable with two-fluid cleaning technology. This study discusses mechanisms to miniaturize the droplets created by a two-fluid nozzle. In addition, this study also considers the impact of droplet size on pattern damage to the Photomask and speaks on the potential for applying two-fluid cleaning technology in the future.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tsutomu Kikuchi, Nobuo Kobayashi, Yoshiaki Kurokawa, Harumichi Hirose, and Mikio Nonaka "Two-fluid cleaning technology for advanced photomask", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791Y (11 May 2009); https://doi.org/10.1117/12.830602
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Photomasks

Particles

Liquids

Electronic components

Manufacturing

Mask cleaning

Water

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