Machine tools error characterization and compensation by on-line measurement of artifact

Abdul Wahid Khan; Wuyi Chen; Lili Wu

doi:10.1117/12.839866

20 November 2009 Machine tools error characterization and compensation by on-line measurement of artifact

Abdul Wahid Khan, Wuyi Chen, Lili Wu

Proceedings Volume 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems; 75110K (2009) https://doi.org/10.1117/12.839866
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China

Abstract

Most manufacturing machine tools are utilized for mass production or batch production with high accuracy at a deterministic manufacturing principle. Volumetric accuracy of machine tools depends on the positional accuracy of the cutting tool, probe or end effector related to the workpiece in the workspace volume. In this research paper, a methodology is presented for volumetric calibration of machine tools by on-line measurement of an artifact or an object of a similar type. The machine tool geometric error characterization was carried out through a standard or an artifact, having similar geometry to the mass production or batch production product. The artifact was measured at an arbitrary position in the volumetric workspace with a calibrated Renishaw touch trigger probe system. Positional errors were stored into a computer for compensation purpose, to further run the manufacturing batch through compensated codes. This methodology was found quite effective to manufacture high precision components with more dimensional accuracy and reliability. Calibration by on-line measurement gives the advantage to improve the manufacturing process by use of deterministic manufacturing principle and found efficient and economical but limited to the workspace or envelop surface of the measured artifact's geometry or the profile.

Citation Download Citation

Abdul Wahid Khan, Wuyi Chen, and Lili Wu "Machine tools error characterization and compensation by on-line measurement of artifact", Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 75110K (20 November 2009); https://doi.org/10.1117/12.839866

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