Paper
19 February 2010 Challenges and opportunities of manufacturing the next generation of integrated photonics
R. Singh, N. Gupta, J. A. Sadie, K. F. Poole, J. Ballato, S. J. Hwu
Author Affiliations +
Abstract
Integrated photonics has the potential of fabricating a diverse set of photonic systems on a single substrate. At nanoscales (< 100 nm), the properties of material depend on quantum confinements. The challenge is to integrate these unique properties of nanostructures into low-cost manufacturing. For material deposition, a photo-assisted monolayer deposition technique can provide nanomaterials with an ultra-low defect density. Epitaxial dielectrics offer the possibility of growing defect-free optical materials including compound semiconductors on silicon substrates. In this paper, we have also provided manufacturing directions that must be incorporated for developing the next generation of integrated photonics.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Singh, N. Gupta, J. A. Sadie, K. F. Poole, J. Ballato, and S. J. Hwu "Challenges and opportunities of manufacturing the next generation of integrated photonics", Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 75910N (19 February 2010); https://doi.org/10.1117/12.845954
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Cited by 1 scholarly publication.
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KEYWORDS
Silicon

Integrated photonics

Manufacturing

Dielectrics

Indium

Interfaces

Optical components

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