Advanced multilayer Laue lens fabrication at NSLS-II

Ray Conley; Nathalie Bouet; Juan Zhou; Hanfei Yan; Yong Chu; Kenneth Lauer; Jesse Miller; Luke Chu; Nima Jahedi

doi:10.1117/12.930216

19 October 2012 Advanced multilayer Laue lens fabrication at NSLS-II

Ray Conley, Nathalie Bouet, Juan Zhou, Hanfei Yan, Yong Chu, Kenneth Lauer, Jesse Miller, Luke Chu, Nima Jahedi

Author Affiliations +

Proceedings Volume 8502, Advances in X-Ray/EUV Optics and Components VII; 850202 (2012) https://doi.org/10.1117/12.930216
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

In an ongoing effort to advance the state of the art in x-ray nanofocusing optics ^[1], multilayer Laue lens (MLL) ^[2,3] fabrication at NSLS-II has matured to include multi-gas reactive sputtering for stress and interfacial roughness reduction, which has recently led to a 70 micron thick single-growth MLL. Reactive sputtering was found to produce WSi₂/Si multilayers with an accumulated film stress significantly lower than Ar-only deposition with identical growth conditions. Significant effort has been focused on the achievement of highly-stable gas mixing and process gas pressure measurement for multilayer growth and the problems faced along with implemented solutions will be discussed in detail. Proper layer thickness and placement throughout the stack presents a major obstacle to the fabrication of high-quality nanofocusing MLLs. Initial metrology of extremely thick MLLs by stitching many scanning electron microscope images was found to be greatly simplified by inclusion of marker labels within the stack.

Citation Download Citation

Ray Conley, Nathalie Bouet, Juan Zhou, Hanfei Yan, Yong Chu, Kenneth Lauer, Jesse Miller, Luke Chu, and Nima Jahedi "Advanced multilayer Laue lens fabrication at NSLS-II", Proc. SPIE 8502, Advances in X-Ray/EUV Optics and Components VII, 850202 (19 October 2012); https://doi.org/10.1117/12.930216

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