Paper
3 May 2013 Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm
Adam F. G. Leontowich, Andrew Aquila, Francesco Stellato, Richard Bean, Holger Fleckenstein, Mauro Prasciolu, Mengning Liang, Daniel P. DePonte, Anton Barty, Fenglin Wang, Jakob Andreasson, Janos Hajdu, Henry N. Chapman, Saša Bajt
Author Affiliations +
Abstract
A super-polished substrate with an off-axis parabola figure was coated with a Sc/B4C/Cr multilayer. This optic was used to focus pulses of 4.3 nm photons from the Free-electron LASer in Hamburg (FLASH) at normal incidence. Beam imprints were made in poly(methyl methacrylate) to align the optic and to measure the beam profile at the focal plane. The intense interaction resulted in imprints with raised perimeters, surrounded by ablated material extending out several micrometres. These features interfere with the beam profile measurement. The effect of a post-exposure development step on the beam imprints was investigated.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adam F. G. Leontowich, Andrew Aquila, Francesco Stellato, Richard Bean, Holger Fleckenstein, Mauro Prasciolu, Mengning Liang, Daniel P. DePonte, Anton Barty, Fenglin Wang, Jakob Andreasson, Janos Hajdu, Henry N. Chapman, and Saša Bajt "Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm", Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 87770T (3 May 2013); https://doi.org/10.1117/12.2022403
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Multilayers

Free electron lasers

Photomicroscopy

Polymethylmethacrylate

Optical testing

Signal attenuation

Mirrors

Back to Top