Implementable and systematic mitigation of native defects in EUV masks

Wen-Chang Hsueh; Li-Chih Yeh; Ming-Jiun Yao; Yun-Yue Lin; Jia-Jen Chen; Shin-Chang Lee; Anthony Yen

doi:10.1117/12.2025786

9 September 2013 Implementable and systematic mitigation of native defects in EUV masks

Wen-Chang Hsueh, Li-Chih Yeh, Ming-Jiun Yao, Yun-Yue Lin, Jia-Jen Chen, Shin-Chang Lee, Anthony Yen

Proceedings Volume 8880, Photomask Technology 2013; 88800Y (2013) https://doi.org/10.1117/12.2025786
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

Native defects in mask blanks is one of the key issues in extreme ultraviolet lithography. If defect-free mask blanks is the only solution, the resulting cost will be very high due to the low yield of such blanks. In this paper, we present a method for fabricating defect-free-like EUV masks by implementing several novel techniques such as global pattern shift, fine metrology-orientation and precise e-beam second-alignment from blank preparation to e-beam exposure. The mitigation success rate versus mask pattern density is simulated and verified by lithographic results using mitigated masks. Our methodology provides a way to achieve defect-free-like EUV mask blanks.

Citation Download Citation

Wen-Chang Hsueh, Li-Chih Yeh, Ming-Jiun Yao, Yun-Yue Lin, Jia-Jen Chen, Shin-Chang Lee, and Anthony Yen "Implementable and systematic mitigation of native defects in EUV masks", Proc. SPIE 8880, Photomask Technology 2013, 88800Y (9 September 2013); https://doi.org/10.1117/12.2025786

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