Universal grating coupler design

Yun Wang; Jonas Flueckiger; Charlie Lin; Lukas Chrostowski

doi:10.1117/12.2042185

11 October 2013 Universal grating coupler design

Yun Wang, Jonas Flueckiger, Charlie Lin, Lukas Chrostowski

Proceedings Volume 8915, Photonics North 2013; 89150Y (2013) https://doi.org/10.1117/12.2042185
Event: Photonics North 2013, 2013, Ottawa, Canada

Abstract

A universal design methodology for grating couplers based on the silicon-on-insultator platform is presented in this paper. Our design methodology accomodates various etch depths, silicon thickness (e.g., 220 nm, 300 nm), incident angles, and cladding materials (e.g., silicon oxide or air), and has been verified by simulations and measurement results. Further more, the design methodology presented can be applied to a wide range, from 1260 nm to 1675 nm, of wavelengths.

Citation Download Citation

Yun Wang, Jonas Flueckiger, Charlie Lin, and Lukas Chrostowski "Universal grating coupler design", Proc. SPIE 8915, Photonics North 2013, 89150Y (11 October 2013); https://doi.org/10.1117/12.2042185

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