Publisher’s Note: This paper, originally published on 2 April 2014, was replaced with a corrected/revised version on 14 May 2014. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance. |
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CITATIONS
Cited by 7 scholarly publications.
Semiconducting wafers
Line edge roughness
Directed self assembly
Line width roughness
Edge roughness
Etching
Critical dimension metrology