A study of the non-uniform current density influence in reactive sputtering deposition

Tao Wang; He Yu; Chao Chen; Yang Wang; Yadong Jiang

doi:10.1117/12.2069207

2 September 2014 A study of the non-uniform current density influence in reactive sputtering deposition

Tao Wang, He Yu, Chao Chen, Yang Wang, Yadong Jiang

Proceedings Volume 9284, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronics Materials and Devices for Sensing and Imaging; 92841A (2014) https://doi.org/10.1117/12.2069207
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China

Abstract

In this work, a modeling for reactive sputtering has been presented where the non-uniform current density is taken into account. The model in this paper can be used to understand the process of reactive magnetron sputtering. The results are compared with those that assume uniform discharge current density distributed on the target. It can be concluded that the process with the non-uniform discharge density shows a higher flow of gas reactive when occurring the hysteresis behavior. In addition, a study of the radial variation of the target composition in metallic and compound mode is also performed.

Citation Download Citation

Tao Wang, He Yu, Chao Chen, Yang Wang, and Yadong Jiang "A study of the non-uniform current density influence in reactive sputtering deposition", Proc. SPIE 9284, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronics Materials and Devices for Sensing and Imaging, 92841A (2 September 2014); https://doi.org/10.1117/12.2069207

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