Direct laser beam interference patterning technique for fast high aspect ratio surface structuring

Simonas Indrisiunas; Bogdan Voisiat; Airidas Žukauskas; Gediminas Račiukaitis

doi:10.1117/12.2079826

4 March 2015 Direct laser beam interference patterning technique for fast high aspect ratio surface structuring

Simonas Indrisiunas, Bogdan Voisiat, Airidas Žukauskas, Gediminas Račiukaitis

Proceedings Volume 9350, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XX; 935003 (2015) https://doi.org/10.1117/12.2079826
Event: SPIE LASE, 2015, San Francisco, California, United States

Abstract

New results on development of the Direct Laser Interference Patterning (DLIP) technique using the interference of several beams to directly ablate the material are presented. The method is capable of producing sub-wavelength features not limited by a beam spot size and is an effective method of forming two-dimensional periodic structures on relatively large area with just a single laser shot. Surface texturing speed of DLIP method and the direct laser writing was compared. Fabrication time reduction up to a few orders of magnitude using DLIP was evaluated. The sub-period scanning technique was applied for formation of the complex periodic structures. A new method of laser scanning for fabrication of periodic structures on large areas without any visible stitching signs between laser irradiation spots was tested.

Citation Download Citation

Simonas Indrisiunas, Bogdan Voisiat, Airidas Žukauskas, and Gediminas Račiukaitis "Direct laser beam interference patterning technique for fast high aspect ratio surface structuring", Proc. SPIE 9350, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XX, 935003 (4 March 2015); https://doi.org/10.1117/12.2079826

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