How laser damage resistance of HfO2/SiO2 optical coatings is affected by embedded contamination caused by pausing the deposition process

Ella Field; John Bellum; Damon Kletecka

doi:10.1117/12.2185739

14 July 2015 How laser damage resistance of HfO₂/SiO₂ optical coatings is affected by embedded contamination caused by pausing the deposition process

Ella Field, John Bellum, Damon Kletecka

Author Affiliations +

Proceedings Volume 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers; 95320J (2015) https://doi.org/10.1117/12.2185739
Event: Pacific Rim Laser Damage, 2015, Jiading, Shanghai, China

Abstract

Reducing contamination is essential for producing optical coatings with high resistance to laser damage. One aspect of this principle is to make every effort to limit long interruptions during the coating’s deposition. Otherwise, contamination may accumulate during the pause and become embedded in the coating after the deposition is restarted, leading to a lower laser-induced damage threshold (LIDT). However, pausing a deposition is sometimes unavoidable, despite our best efforts. For example, a sudden hardware or software glitch may require hours or even overnight to solve. In order to broaden our understanding of the role of embedded contamination on LIDT, and determine whether a coating deposited under such non-ideal circumstances could still be acceptable, this study explores how halting a deposition overnight impacts the LIDT, and whether ion cleaning can be used to mitigate any negative effects on the LIDT. The coatings investigated are a beam splitter design for high reflection at 1054 nm and high transmission at 527 nm, at 22.5° angle of incidence in S-polarization. LIDT tests were conducted in the nanosecond regime.

Citation Download Citation

Ella Field, John Bellum, and Damon Kletecka "How laser damage resistance of HfO₂/SiO₂ optical coatings is affected by embedded contamination caused by pausing the deposition process", Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 95320J (14 July 2015); https://doi.org/10.1117/12.2185739

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