Novel neutral under layer materials to enhance the photolithography performance and defectivity for chemo-epitaxy process

Ryuta Mizuochi; Hiroyuki Wakayama; Yasunobu Someya; Rikimaru Sakamoto

doi:10.1117/12.2219005

21 March 2016 Novel neutral under layer materials to enhance the photolithography performance and defectivity for chemo-epitaxy process

Ryuta Mizuochi, Hiroyuki Wakayama, Yasunobu Someya, Rikimaru Sakamoto

Author Affiliations +

Proceedings Volume 9779, Advances in Patterning Materials and Processes XXXIII; 97791Z (2016) https://doi.org/10.1117/12.2219005
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Neutral layer (NL) material is one of the key materials for aligning block-co-polymer (BCP). In this study, NLs were designed and investigated, which have the capability to enhance the photo-lithography performance, a good alignment performance of BCP, and reduce the defectivity after chemo-epitaxy process. In order to enhance the photo-lithography performance, some new polymers were prepared with chromophores to control n/k value and adhesive unit interacted with the photo resist. The surface energy of these materials was adjusted to the neutral for BCP by controlling the ratio of chromophore and adhesion unit. The defects were also investigated and achieved low defectivity by optimized materials. Since this material has the above properties, it shows a good perpendicularly alignment pattern of BCP and a photolithography performance.

Citation Download Citation

Ryuta Mizuochi, Hiroyuki Wakayama, Yasunobu Someya, and Rikimaru Sakamoto "Novel neutral under layer materials to enhance the photolithography performance and defectivity for chemo-epitaxy process", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97791Z (21 March 2016); https://doi.org/10.1117/12.2219005

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