Optical metrology for advanced process control: full module metrology solutions

Cornel Bozdog; Igor Turovets

doi:10.1117/12.2219919

23 March 2016 Optical metrology for advanced process control: full module metrology solutions

Cornel Bozdog, Igor Turovets

Proceedings Volume 9782, Advanced Etch Technology for Nanopatterning V; 97820E (2016) https://doi.org/10.1117/12.2219919
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Optical metrology is the workhorse metrology in manufacturing and key enabler to patterning process control. Recent advances in device architecture are gradually shifting the need for process control from the lithography module to other patterning processes (etch, trim, clean, LER/LWR treatments, etc..). Complex multi-patterning integration solutions, where the final pattern is the result of multiple process steps require a step-by-step holistic process control and a uniformly accurate holistic metrology solution for pattern transfer for the entire module. For effective process control, more process “knobs” are needed, and a tighter integration of metrology with process architecture.

Citation Download Citation

Cornel Bozdog and Igor Turovets "Optical metrology for advanced process control: full module metrology solutions", Proc. SPIE 9782, Advanced Etch Technology for Nanopatterning V, 97820E (23 March 2016); https://doi.org/10.1117/12.2219919

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