Niobium nitride (NbN) is widely used in single-photon detectors, hot electron bolometer mixers, and superconducting quantum bits. The structural similarity between NbN and III-nitrides offers the possibility that high-quality NbN superconductor thin films can be epitaxially grown on III-nitride devices. However, the characteristics of epitaxial NbN films are still unveiled.
In this presentation, we will discuss the structural and electrical properties of NbN films epitaxially grown on AlN by sputtering. The formation mechanism of NbN twins on AlN will be shown, and techniques to reduce the NbN twin boundaries will be presented.
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