Poster
6 October 2023 Structural coloration using bandgap engineered, low-optical losses hydrogenated amorphous silicon
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Conference Poster
Abstract
Here, we demonstrated vivid structural coloration and polarization-sensitive color metasurfaces using bandgap-engineered a-Si:H, whose extinction coefficient is near zero at the entire visible spectrum. The scattering response of high-index nanostructures is numerically analyzed with multipole expansion, and we vitrify that the low-optical losses of bandgap-engineered a-Si:H significantly improve color coverage of metasurface, achieving comparable coverage with the Adobe RGB gamut. Also, we demonstrated the application of optical encryption with polarization-sensitive structural coloration, achieving near-zero reflection when optical information is encrypted. We believe that structural coloration with low-loss a-Si:H will be widely used with its advantageous benefits compared to chemical pigments.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Younghwan Yang, Jaehyuck Jang, Chunghwan Jung, Trevon Badloe, and Junsuk Rho "Structural coloration using bandgap engineered, low-optical losses hydrogenated amorphous silicon", Proc. SPIE PC12646, Metamaterials, Metadevices, and Metasystems 2023, PC126461O (6 October 2023); https://doi.org/10.1117/12.2673186
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KEYWORDS
Amorphous silicon

Gallium nitride

Refractive index

Titanium dioxide

Reflection

Scattering

Semiconductors

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