Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
Abstract
Given a circuit pattern to print, how can we determine the optimal lithography approach? If traditional lithography provides sufficient process latitude, there is little reason to use resolution enhancement techniques (RETs). Otherwise we need to pick the appropriate enhancement technique or combination of techniques. An effective procedure for choosing suitable techniques comprises:
1. include applicable approaches based on physical principles,
2. select promising techniques by simulation,
3. determine actual process latitude by experimentation.
This three-step methodology is demonstrated via a 1-Gb dynamic random access memory (DRAM) example.
Online access to SPIE eBooks is limited to subscribing institutions.