Symmetry measure and phase-matched filters in pattern recognition

Stephan Teiwes; Frank Wyrowski

doi:10.1117/12.179884

1 November 1994 Symmetry measure and phase-matched filters in pattern recognition

Stephan Teiwes, Frank Wyrowski

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Optical Engineering, Vol. 33, Issue 11, (November 1994). https://doi.org/10.1117/12.179884

Abstract

The use of the diffraction phenomenon in pattern recognition is a well-established area in optical information processing. Typically the generation of a correlation peak by suitable filters is used to recognize a pattern. We introduce a symmetry measure for pattern recognition. It can be used for a wide class of filters, which we call phase-matched filters. Encoding techniques of diffractive optics allow its implementation as amplitude- or phase-encoded filters.

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Stephan Teiwes and Frank Wyrowski "Symmetry measure and phase-matched filters in pattern recognition," Optical Engineering 33(11), (1 November 1994). https://doi.org/10.1117/12.179884

Published: 1 November 1994

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KEYWORDS

Electronic filtering

Phase only filters

Sensors

Computer programming

Pattern recognition

Optical filters

Optical pattern recognition

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