1 May 1996 Fabrication, characterization, and applications of high-performance AlGaAs-based buried-heterostructure diode lasers
Alexei V. Syrbu, Alexandru Z. Mereutza, Grigore I. Suruceanu, Vladimir P. Iacovlev, Andrei N. Caliman, Anatol T. Lupu, Stanislav T. Vieru, Marius Predescu, Ion M. Popescu, Radu G. Ispasoiu
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Data are presented on buried-heterostructure (BH) AlGaAs/ GaAs and InGaAs/AlGaAs quantum-well diode lasers (DLs) fabricated by low-temperature liquid phase mesa melt etching and regrowth. The basic laser structures were grown by either molecular beam epitaxy (MBE) or metal-organic chemical vapor deposition (MOCVD). Native oxides were used as a mask in the processes of melt etching and regrowth. Measurements of excess mirror temperature and parameters of internal second-harmonic generation (SHG) were used for DL characterization. The equalization of beam divergence in both planes, perpendicular and parallel to the active layer, was accomplished by using cylindrical microlenses, at 1 W of radiant power in continuous-wave (cw) operation. The results on medical applications and pumping Er31-doped YAG crystals are reported.
Alexei V. Syrbu, Alexandru Z. Mereutza, Grigore I. Suruceanu, Vladimir P. Iacovlev, Andrei N. Caliman, Anatol T. Lupu, Stanislav T. Vieru, Marius Predescu, Ion M. Popescu, and Radu G. Ispasoiu "Fabrication, characterization, and applications of high-performance AlGaAs-based buried-heterostructure diode lasers," Optical Engineering 35(5), (1 May 1996). https://doi.org/10.1117/1.600667
Published: 1 May 1996
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Cited by 3 scholarly publications.
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KEYWORDS
Mirrors

Semiconductor lasers

Oxides

Temperature metrology

Etching

Er:YAG lasers

Erbium

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