6 July 2016 Aberration measurements in speckle field by Shack–Hartmann wavefront sensor
Andrey A. Goloborodko, Myhaylo M. Kotov, Vitaliy N. Kurashov, Dmytro V. Podanchuk
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Abstract
The accuracy of the Shack–Hartmann wavefront sensor for measuring wavefront aberrations is mainly dependent upon the measuring accuracy of the centroid of each spot. An effect of the aperture of the 4F system on the correlation properties of speckle patterns produced with monochromatic light is investigated at the Shack–Hartmann sensor plane and at the focal plane of the sensor. An expression for a speckle patterns correlation length changing due to the extended aperture of the 4F system is derived by Fourier optics method. The experimental results that confirm the theoretical dependence quality within the limits of errors are obtained, and it is shown that the spatial finiteness of the optical system causes significant changes of transferred aberrated field.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2016/$25.00 © 2016 SPIE
Andrey A. Goloborodko, Myhaylo M. Kotov, Vitaliy N. Kurashov, and Dmytro V. Podanchuk "Aberration measurements in speckle field by Shack–Hartmann wavefront sensor," Optical Engineering 55(12), 121710 (6 July 2016). https://doi.org/10.1117/1.OE.55.12.121710
Published: 6 July 2016
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Cited by 3 scholarly publications.
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KEYWORDS
Speckle

Wavefront sensors

Sensors

Diffusers

Wavefronts

Speckle pattern

Error analysis

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