5 November 2020 Analysis of laser-induced contamination at 515 nm in the sub-ps/MHz regime
Georges Gebrayel El Reaidy, Laurent Gallais
Author Affiliations +
Abstract

We study laser-induced contamination (LIC) as a potential cause of optical losses and laser-induced damage of optical components for ultrashort pulse lasers with high average power in the MHz regime. Our work is conducted on dichroic mirrors designed for maximum reflection at 515 nm operated in ambient air. Based on the development of an experimental set-up for real-time monitoring of LIC and accelerated test protocols, we have conducted a parametric study on LIC development and studied its growth dynamics and morphology. We show that LIC is a main limitation of short-wavelength, high average power fs/ps lasers, with the formation of nanometric highly absorbing layers of carbonate compounds on the laser footprint, with evidence of thermal effects. It is also found that the last layer of the stack, at the interface between air and coating stack, is critical in the LIC growth which can open some perspectives for limitation of this effect.

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2020/$28.00 © 2020 SPIE
Georges Gebrayel El Reaidy and Laurent Gallais "Analysis of laser-induced contamination at 515 nm in the sub-ps/MHz regime," Optical Engineering 60(3), 031004 (5 November 2020). https://doi.org/10.1117/1.OE.60.3.031004
Received: 24 August 2020; Accepted: 20 October 2020; Published: 5 November 2020
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Contamination

Absorption

Mirrors

Coating

Electroluminescence

Laser induced damage

Optical engineering

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