We report progress in the development of GaAs-based laser diodes with ultra-wide stripe widths of W = 1200 μm emitting at a wavelength of λ = 915 nm. In order to restrict ring oscillations and higher order modes in these ultra-wide devices we utilise periodic current structuring with a period of 29 μm and width of 20 μm. We compare the performance of a device with current structuring realised through contact layer implantation of the device after epitaxial growth, termed a 'Contact Implant' laser, and a device with buried current structuring close to the active region of the device realised using two step epitaxial regrowth and Buried-Regrown-Implant-Structure (BRIS) technology, termed a 'BRIS' laser. Quasi-Continuous Wave (QCW) measurement of the devices show that both the 'Contact Implant' and 'BRIS' laser achieve a very high peak output power of Popt = 200 W at a power conversion efficiency of ηE = 59% and ηE = 52%, respectively, with a peak efficiency of around 70%. QCW beam-quality measurements show that the 'BRIS' laser has a much reduced 95% power content far-field angle of 9°, compared to 12.7° for the 'contact implant' laser, at a power of Popt = 100 W. Under Continuous Wave (CW) operation the 'contact implant' laser reaches an output power of Popt = 68 W at ηE = 57% and the 'BRIS' laser reaches Popt = 53 W at ηE = 50%, but with a reduced far-field angle of 11.9° at Popt = 40 W for the 'BRIS' laser.
Epi-down mounting can degrade performance in broad area lasers when the stress field extends into the active region. Thick p-side epitaxial layers have the potential to isolate the device from external stress, but add electrical resistance and losses from current spreading. Therefore, we use two-step epitaxy to combine highly-doped p-side epitaxial layers (2x thicker than conventional) with a resistive oxygen-implanted layer located close to the active region to block lateral current spreading. The resulting buried-regrown-implant-structure (BRIS) lasers with 100 μm stripes and lasing wavelength of 915 nm show high efficiency (peak of 67%, 55% at 20 W) and high lateral brightness (3.3 W/mm·mrad up to 17.5 W output power), improved over reference devices, in spite of the thick p-side.
GaAs-based 1-cm bars based on extreme-triple-asymmetric (ETAS) epitaxial designs are presented. The investigated structure shows low optical loss and weak power saturation at high current allowing high output power Popt and power-conversion-efficiency ηΕ. The resulting ETAS bars containing 20 emitters with 395 μm wide stripes and 4 mm long cavity, operate with the highest-to-date quasi-continuous-wave power (200 μs, 10 Hz) Popt = 1.9 kW, delivered from just one quantum well, with maximum ηΕ = 67% at THS = 298 K heat-sink temperature. High ηΕ = 62% is maintained at 1.0 kW and remains 55% at 1.5 kW. Even higher Popt = 2.26 kW is achieved at a reduced THS = 203 K. At 203 K, maximum ηΕ climbs to 74% while maintaining a high ηΕ < 60% up to 2 kW, and reaches 55% at 2.26 kW. We also present progress in lateral bar layout, which is further optimized for narrow lateral beam divergence and evaluated for the first time up to 2 kA current. Experimental results show that lateral far field at 95% power can be lowered by 2-3° without sacrificing Popt and ηΕ, reaching ~15° at 1.8 kW at 298 K. Polarization purity also remains < 95% across the full measured range.
GaAs based high power broad area lasers are the most efficient source of optical energy and are used in many industrial applications. Despite considerable improvement in power and efficiency in recent years, further improvement is needed due to the high demand from industry. We review here progress in vertical epitaxial layer design, showing how higher performance is enabled by migrating from asymmetric large optical cavity (ASLOC) designs to the newly developed extreme-triple-asymmetric (ETAS) vertical structure. Building on earlier studies at 940 nm, we focus on gain-guided lasers that have operating wavelength 970 nm, have 90 μm stripe width and 4 mm resonator length. We can emphasize the positive impact of epitaxial layer design, without need for advanced lateral structures. We show how design improvement increases conversion efficiency ηΕ at 12 W output power from 56% to 66%, whilst peak (saturation) power increases from Popt = 14 to 19 W in continuous wave (CW) mode for p-down single emitters on CuW carriers (thermal resistance 3 K/W). Progress in epitaxial design also leads to smaller lateral beam parameter product (BP Plat) at higher bias, leading to lateral brightness Popt/BPPlat < 3 W/mm × mrad. Specifically, in these most recent ETAS structures, by design BPPlat increases more slowly with self-heating, and this leads directly to lower BPPlat at high bias. We will also review options for further increased performance, include efforts to understand and improve BPPlat, which is also limited by a non-thermal ground level BPP0 (here ∼ 1 mm × mrad).
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