Dr. Annelise During Profile

Dr. Annelise During

Engineer at CEA Cesta

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 15 January 2007 Paper

Laser conditioning of KDP crystals using excimer and Nd:YAG lasers

B. Bertussi, D. Damiani, M. Pommies, A. Dyan, H. Piombini, X. Leborgne, A. During, L. Lamaignere, G. Gaborit, M. Loiseau, S. Mardelle, T. Donval

Proceedings Volume 6403, 64031N (2007) https://doi.org/10.1117/12.695434

KEYWORDS: Excimer lasers, Crystals, Laser crystals, Nd:YAG lasers, Laser induced damage, Excimers, Laser scattering, Charge-coupled devices, Scattering, Photodiodes

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Proceedings Article | 15 January 2007 Paper

Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam

Annelise During, Philippe Bouchut, Jean-Guillaume Coutard, Christophe Leymarie, Hervé Bercegol

Proceedings Volume 6403, 640323 (2007) https://doi.org/10.1117/12.695446

KEYWORDS: Silica, Laser induced damage, Carbon dioxide lasers, Resistance, YAG lasers, Nd:YAG lasers, Diagnostics, Carbon monoxide, Gas lasers, Optical components

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Proceedings Article | 20 October 2005 Paper

Megajoule laser project and polishing processes for high laser induced damage threshold at 351 nm

J. Néauport, P. Cormont, N. Darbois, A. During, N. Ferriou, E. Lavastre, I. Legoff, D. Leschuitta, C. Maunier, C. Pellegrini, D. Taroux, D. Valla

Proceedings Volume 5965, 59650N (2005) https://doi.org/10.1117/12.633499

KEYWORDS: Silica, Polishing, Optics manufacturing, Laser induced damage, Laser damage threshold, Laser processing, Mirrors, Ultraviolet radiation, Crystals, Manufacturing

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Proceedings Article | 21 February 2005 Paper

Integrated facility of UV and IR laser process to enhance laser damage resistance of large scale 3w optics

Annelise During, Laurent Lamaignere, Philippe Bouchut, Herve Piombini

Proceedings Volume 5647, (2005) https://doi.org/10.1117/12.585001

KEYWORDS: Silica, Laser induced damage, Raster graphics, Resistance, Excimer lasers, Gas lasers, YAG lasers, Pulsed laser operation, Laser processing, UV optics

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Proceedings Article | 20 September 2004 Paper

Enhanced optical damage resistance of fused silica surfaces using UV laser conditioning and CO2 laser treatment

Laurent Lamaignere, Herve Bercegol, Philippe Bouchut, Annelise During, Jerome Neauport, Herve Piombini, Gerard Raze

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.547071

KEYWORDS: Silica, Laser induced damage, Polishing, Carbon dioxide lasers, Resistance, Laser optics, Nd:YAG lasers, Laser development, Ultraviolet radiation, Excimer lasers

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Proceedings Article | 10 June 2004 Paper

Photothermal microscopy for the study of laser damage initiation by measurement of absorption modification of silica seeded with gold nanoparticles

Annelise During, Bertrand Bertussi, Mireille Commandre, Jean-Yves Natoli, Florian Bonneau, Patrick Combis, Jean-Luc Rullier, Emmanuel Cottancin, Michel Pellarin

Proceedings Volume 5273, (2004) https://doi.org/10.1117/12.524856

KEYWORDS: Silica, Absorption, Gold, Nanoparticles, Atomic force microscopy, Particles, Microscopy, Laser induced damage, Microscopes, Laser beam diagnostics

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Proceedings Article | 25 February 2004 Paper

Correlation between laser-induced damage and nanosized absorbing defects

Bertrand Bertussi, Jean-Yves Natoli, Annelise During, Mireille Commandre, Laurent Gallais, Jean Luc Rullier, Herve Bercegol, Philippe Bouchut

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.513373

KEYWORDS: Particles, Gold, Absorption, Microscopes, Silica, Laser induced damage, Laser applications, Optical components, Laser development, Pulsed laser operation

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Proceedings Article | 4 November 2003 Paper

Photothermal microscopy and laser damage in optical components

Mireille Commandre, Jean Yves Natoli, Claude Amra, Annelise During, Laurent Gallais

Proceedings Volume 5188, (2003) https://doi.org/10.1117/12.505890

KEYWORDS: Laser induced damage, Microscopy, Optical components, Silica, Optical semiconductors, Semiconductors, Nanotechnology, High power lasers, Light emitting diodes, Spatial resolution

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Proceedings Article | 30 May 2003 Paper

Photothermal microscopy for in-situ study of laser damage induced by gold inclusions

Annelise During, Mireille Commandre, Caroline Fossati, Jean-Yves Natoli, Jean-Luc Rullier, Herve Bercegol, Philippe Bouchut

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.472434

KEYWORDS: Gold, Absorption, Laser beam diagnostics, Laser induced damage, Microscopy, Laser damage threshold, Microscopes, Silica, Atomic force microscopy, Refraction

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Proceedings Article | 9 April 2002 Paper

Development of a photothermal microscope for multiscale studies of defects

Annelise During, Caroline Fossati, Mireille Commandre

Proceedings Volume 4679, (2002) https://doi.org/10.1117/12.461681

KEYWORDS: Laser beam diagnostics, Absorption, Microscopes, Laser induced damage, Spatial resolution, Thin films, Refractive index, Defect detection, Modulation, Calibration

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Proceedings Article | 12 April 2001 Paper

Correlation between absorption and scattering imaging in optical materials (Abstract Only)

Mireille Commandre, Alexandre Gatto, Annelise During, Caroline Fossati

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425022

KEYWORDS: Scattering, Absorption, Light scattering, Raman scattering, Scatter measurement, Optical imaging, Spatial resolution, Refractive index, Particles, Thin films

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Showing 5 of 11 publications

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