Dr. Bahram Ghodsian
SPIE Involvement:
Author | Instructor
Publications (4)

SPIE Journal Paper | 1 July 2002
JM3, Vol. 1, Issue 02, (July 2002) https://doi.org/10.1117/12.10.1117/1.1484162
KEYWORDS: Etching, Anisotropic etching, Oxides, Silicon, Fabrication, Semiconducting wafers, CMOS technology, Low pressure chemical vapor deposition, Micromachining, Bulk micromachining

Proceedings Article | 30 August 1999 Paper
Bahram Ghodsian, Veljko Milanovic, Orlando Villavicencio
Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361212
KEYWORDS: Etching, Anisotropic etching, Oxides, Fabrication, Semiconducting wafers, Silicon, Photomasks, CMOS technology, Low pressure chemical vapor deposition, Micromachining

Proceedings Article | 8 September 1998 Paper
Bahram Ghodsian, Marek Syrzycki, M. Parameswaran
Proceedings Volume 3514, (1998) https://doi.org/10.1117/12.323915
KEYWORDS: Sensors, Electrodes, Oxides, Ionization, Semiconducting wafers, Manufacturing, Silicon, Molecules, Micromachining, Oxidation

Proceedings Article | 23 September 1996 Paper
Bahram Ghodsian, M. Parameswaran, Marek Syrzycki
Proceedings Volume 2879, (1996) https://doi.org/10.1117/12.251207
KEYWORDS: Silicon, Etching, Semiconducting wafers, Electroplating, Gold, Sensors, Anisotropic etching, Nickel, Plating, Ionization

Course Instructor
SC236: Polysilicon Surface Micromachine Technology and Devices
This course is designed to introduce newcomers to micromachining technology and concepts as well as those with a basic familiarity with integrated circuit manufacturing technology about the emerging field of Micro Electro Mechanical Systems (MEMS). Both manufacturing technologies for these devices and examples of sensor and actuator devices will be presented. The course focuses on polysilicon surface micromachining, but will also include a brief overview of other MEMS manufacturing technologies and devices.
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