Dr. Cheming M. Hu Profile

Dr. Cheming M. Hu

Project Manager at Macronix International Co Ltd

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Author

Publications (5)

Proceedings Article | 20 March 2018 Paper

OPC model accuracy enhancement for asymmetrical layouts by incorporating 2D contour extraction methodology

Cheng-Huei Lin, Che-Ming Hu, Fred Lo, Elvis Yang, Ta-Hone Yang, K.C. Chen

Proceedings Volume 10587, 105871L (2018) https://doi.org/10.1117/12.2296815

KEYWORDS: Calibration, Optical proximity correction, Data modeling, 3D modeling, Scanning electron microscopy, Critical dimension metrology, Photomasks, Feature extraction, Image segmentation, Semiconducting wafers

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Proceedings Article | 13 March 2018 Paper

Design optimization of highly asymmetrical layouts by 2D contour metrology

C. Hu, Fred Lo, Elvis Yang, T. H. Yang, K. C. Chen

Proceedings Volume 10585, 105852I (2018) https://doi.org/10.1117/12.2292851

KEYWORDS: Scanning electron microscopy, Image processing, Feature extraction, Critical dimension metrology, Lithography, Semiconducting wafers, Metrology, Image acquisition, Finite element methods, Optical proximity correction

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Proceedings Article | 15 March 2016 Paper

Optimizing the lithography model calibration algorithms for NTD process

C. M. Hu, Fred Lo, Elvis Yang, T. H. Yang, K. C. Chen

Proceedings Volume 9780, 978018 (2016) https://doi.org/10.1117/12.2216049

KEYWORDS: Lithography, Optical lithography, Photoresist processing, Calibration, SRAF, Materials processing, Process modeling, Semiconducting wafers, Data modeling, Critical dimension metrology, Remote sensing, Image processing

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Proceedings Article | 31 March 2014 Paper

Adaptive OPC approach based on pattern grouping algorithm

C. Hu, C. Hsuan, H. Hsieh, Fred Lo, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu

Proceedings Volume 9052, 90521X (2014) https://doi.org/10.1117/12.2045371

KEYWORDS: Optical proximity correction, Tolerancing, Photomasks, Lithography, Critical dimension metrology, Optical lithography, Detection and tracking algorithms, Error analysis, Calibration, Printing

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Proceedings Article | 12 April 2013 Paper

Multiple-step process window aware OPC for hyper-NA lithography

C. Hsuan, C. Hu, Fred Lo, Elvis Yang, T. Yang, K. Chen, Chih-Yuan Lu

Proceedings Volume 8683, 868323 (2013) https://doi.org/10.1117/12.2011061

KEYWORDS: Optical proximity correction, Tolerancing, Critical dimension metrology, Lithography, Data modeling, Finite element methods, Metals, Calibration, Photomasks, Inspection

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