CONFERENCE PROCEEDINGS
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Chan-Ho Ryu
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 3 April 2012 Paper
A scatterometry-based CD uniformity control solution for Spacer Patterning Technology
Jongsu Lee, Chang Moon Lim, Chan-Ho Ryu, Myoungsoo Kim, Hyosang Kang, Hugo Cramer, Noelle Wright, Birgitt Hepp, Liesbeth van Reijnen, Hans van der Laan, Maryana Marun, Peter ten Berge
Proceedings Volume 8324, 83241V (2012) https://doi.org/10.1117/12.917824
KEYWORDS: Critical dimension metrology, Optical lithography, Double patterning technology, Deposition processes, Scatterometry, Semiconducting wafers, Process control, Etching, Metrology, Control systems
Proceedings Article | 13 March 2012 Paper
Overlay metrology for low-k1: challenges and solutions
Jens Neumann, Jongsu Lee, Kiho Yang, Byounghoon Lee, Taehyeong Lee, Jeongsu Park, Chang-moon Lim, Donggyu Yim, Sungki Park, Eric Janda, Kaustuve Bhattacharyya, Chan-ho Ryu, Young-Hong Min, Kiki Rhe, Bernd Geh
Proceedings Volume 8326, 832602 (2012) https://doi.org/10.1117/12.916376
KEYWORDS: Overlay metrology, Diffraction, Data modeling, Metrology, Diffraction gratings, Lithography, Semiconducting wafers, Inspection, Printing, Computer simulations
Proceedings Article | 20 April 2011 Paper
Diffraction-based overlay for spacer patterning and double patterning technology
Byoung Hoon Lee, JeongSu Park, Jongsu Lee, Sarohan Park, ChangMoon Lim, Dong-Gyu Yim, Sungki Park, Chan-Ho Ryu, Stephen Morgan, Maurits van de Schaar, Andreas Fuchs, Kaustuve Bhattacharyya
Proceedings Volume 7971, 79712U (2011) https://doi.org/10.1117/12.870473
KEYWORDS: Overlay metrology, Diffraction gratings, Double patterning technology, Diffraction, Optical lithography, Metrology, Resolution enhancement technologies, Semiconducting wafers, Lithography, Scanning electron microscopy
Proceedings Article | 2 April 2010 Paper
A novel robust diffraction-based metrology concept for measurement and monitoring of critical layers in memory devices
Boo-Hyun Ham, Hyun-Jea Kang, Chan Hwang, Jeong-Ho Yeo, Cheol-Hong Kim, Suk-Woo Nam, Joo-Tae Moon, Martyn Coogans, Arie den Boef, Chan-Ho Ryu, Stephen Morgan, Andreas Fuchs
Proceedings Volume 7638, 76381S (2010) https://doi.org/10.1117/12.848399
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction, Diffraction gratings, Metrology, Oxides, Scatterometry, Lithography, Image processing, Photoresist processing
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