In this work, a modeling for reactive sputtering has been presented where the non-uniform current density is taken into account. The model in this paper can be used to understand the process of reactive magnetron sputtering. The results are compared with those that assume uniform discharge current density distributed on the target. It can be concluded that the process with the non-uniform discharge density shows a higher flow of gas reactive when occurring the hysteresis behavior. In addition, a study of the radial variation of the target composition in metallic and compound mode is also performed.
A tunable reflecting micro-optoelectromechanical systems (MOEMS) micromirror is designed for measuring the actual temperature and color of an object based on comparison of two wavelength response windows, 3-5 and 8-12 µm. The MOEMS micromirror with switching between two positions by an applied electrostatic voltage provides a response to two wavelength windows by tuning the optical resonant cavity. Three different structural models of the tunable micromirror, which are made up of single Al layer with type I legs, single Al layer with type L legs, and double Al/Si3N4 layers with type I legs, are designed and simulated accurately using ANSYS tools on a 35-µm pixel-pitch array. On the basis of the comparsion, the third model, made up of double Al/Si3N4 layers with type I legs, is chosen. With different distances between the MOEMS micromirror and the bottom electrode, the total capacitance of the tunable micromirror is gained based on electromagnetic analysis and theoretical equation. The pull-in voltage is calculated as 8.21 V by electrostatic-mechanical coupling analysis, and the maximum stress is 368.744 MPa, which is less than the yield strength of Si3N4 thin film. But if the voltage is increased to ~9.73 V, the micromirror will touch the bottom electrode by pull-in behavior.
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