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Chia Wen Chang
at Nanya Technology Corp
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Publications (1)
Proceedings Article | 30 October 2007 Paper
Evaluation of the effect of mask-blank flatness on CDU and DOF in high-NA systems
Christopher Lee, Chia Wen Chang, Tomas Chin, Richard Lu, Steven Fan, Derek Chen, Gordon Chan, Torey Huang
Proceedings Volume 6730, 67300D (2007) https://doi.org/10.1117/12.746614
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Finite element methods, Critical dimension metrology, Error analysis, Lutetium, Fluctuations and noise, Printing, Pellicles
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