Dr. Chie Shishido Profile

Dr. Chie Shishido

Senior Researcher at Hitachi Ltd

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Author

Publications (18)

SPIE Journal Paper | 1 October 2011

Improved secondary electron extraction efficiency model for accurate measurement of narrow-space patterns using model-based library matching

Chie Shishido, Maki Tanaka, Akira Hamamatsu, Tomoharu Nagao

JM3, Vol. 10, Issue 04, 043017, (October 2011) https://doi.org/10.1117/12.10.1117/1.3664410

KEYWORDS: Scanning electron microscopy, Model-based design, Monte Carlo methods, Calibration, Cadmium, Mathematical modeling, 3D metrology, Scatterometry, Semiconducting wafers, Metrology

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Proceedings Article | 20 April 2011 Paper

Improved secondary electron extraction efficiency model for accurate measurement of narrow-space patterns using model-based library matching

Chie Shishido, Maki Tanaka, Akira Hamamatsu

Proceedings Volume 7971, 79711S (2011) https://doi.org/10.1117/12.878745

KEYWORDS: Scanning electron microscopy, Calibration, Monte Carlo methods, Model-based design, 3D metrology, Mathematical modeling, Silicon, 3D image processing, Scatterometry, Semiconducting wafers

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Proceedings Article | 20 April 2011 Paper

Verification and extension of the MBL technique for photo resist pattern shape measurement

Miki Isawa, Maki Tanaka, Hideyuki Kazumi, Chie Shishido, Akira Hamamatsu, Norio Hasegawa, Peter De Bisschop, David Laidler, Philippe Leray, Shaunee Cheng

Proceedings Volume 7971, 79710Z (2011) https://doi.org/10.1117/12.878960

KEYWORDS: Cadmium, Critical dimension metrology, Photoresist materials, Atomic force microscopy, Metrology, Scanning electron microscopy, Finite element methods, Terbium, Semiconducting wafers, Double patterning technology

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SPIE Journal Paper | 1 January 2011

Accurate measurement of very small line patterns in critical dimension scanning electron microscopy using model-based library matching technique

Chie Shishido, Maki Tanaka, Mayuka Osaki

JM3, Vol. 10, Issue 1, 013010, (January 2011) https://doi.org/10.1117/12.10.1117/1.3541780

KEYWORDS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Critical dimension scanning electron microscopy, Monte Carlo methods, Model-based design, Silicon, Statistical analysis, Cadmium, Image processing

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Proceedings Article | 2 April 2010 Paper

CD bias reduction in CD-SEM of very small line patterns: sidewall shape measurement using model-based library matching method

Chie Shishido, Maki Tanaka, Mayuka Osaki

Proceedings Volume 7638, 76383I (2010) https://doi.org/10.1117/12.846402

KEYWORDS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Monte Carlo methods, Silicon, Model-based design, Image processing, Statistical analysis, Cadmium, Scattering

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Proceedings Article | 2 April 2010 Paper

Application of model-based library approach to photoresist pattern shape measurement in advanced lithography

Naoki Yasui, Miki Isawa, Toru Ishimoto, Kohei Sekiguchi, Maki Tanaka, Mayuka Osaki, Chie Shishido, Norio Hasegawa, Shaunee Cheng

Proceedings Volume 7638, 76382O (2010) https://doi.org/10.1117/12.846504

KEYWORDS: Photoresist materials, Lithography, Critical dimension metrology, Scanning electron microscopy, Lithographic illumination, Model-based design, Process control, Mathematical modeling, Immersion lithography, Semiconducting wafers

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Proceedings Article | 24 March 2009 Paper

CD-bias reduction in CD-SEM line-width measurement for the 32-nm node and beyond using the model-based library method

Chie Shishido, Maki Tanaka, Mayuka Osaki

Proceedings Volume 7272, 72722C (2009) https://doi.org/10.1117/12.813948

KEYWORDS: Critical dimension metrology, Atomic force microscopy, Monte Carlo methods, Silicon, Beam shaping, Model-based design, Scanning electron microscopy, Scattering, Silica, Mathematical modeling

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Proceedings Article | 24 March 2009 Paper

High-precision CD matching monitoring technology using profile gradient method for the 32-nm technology generation

Toru Ikegami, Akemi Kono, Tatsuya Maeda, Mayuka Osaki, Chie Shishido

Proceedings Volume 7272, 72722N (2009) https://doi.org/10.1117/12.813968

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Semiconductors, Image resolution, Electron beams, Contamination, Metrology, Electron microscopes, Optical alignment

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Proceedings Article | 23 March 2009 Paper

Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography

Mayuka Osaki, Maki Tanaka, Chie Shishido, Shaunee Cheng, David Laidler, Monique Ercken, Efrain Altamirano

Proceedings Volume 7272, 727211 (2009) https://doi.org/10.1117/12.813472

KEYWORDS: Etching, Semiconducting wafers, Surface roughness, Finite element methods, Scanning electron microscopy, Lithography, Atomic force microscopy, Critical dimension metrology, Atomic force microscope, Photoresist processing

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Proceedings Article | 16 April 2008 Paper

Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography

Mayuka Osaki, Maki Tanaka, Chie Shishido, Toru Ishimoto, Norio Hasegawa, Kohei Sekiguchi, Kenji Watanabe, Shaunee Cheng, David Laidler, Monique Ercken, Efrain Altamirano

Proceedings Volume 6922, 69221B (2008) https://doi.org/10.1117/12.771886

KEYWORDS: Critical dimension metrology, Etching, Photoresist processing, Lithography, Scanning electron microscopy, Semiconducting wafers, Finite element methods, Signal attenuation, Process control, Metrology

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Proceedings Article | 24 March 2008 Paper

Application of model-based library approach to Si3N4 hardmask measurements

Maki Tanaka, Chie Shishido, Wataru Nagatomo, Kenji Watanabe

Proceedings Volume 6922, 69222L (2008) https://doi.org/10.1117/12.772097

KEYWORDS: Atomic force microscopy, Scanning electron microscopy, Scanning transmission electron microscopy, Monte Carlo methods, Critical dimension metrology, Metrology, Calibration, Silicon, Cadmium, Model-based design

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Proceedings Article | 24 March 2008 Paper

CD bias reduction in CD-SEM linewidth measurements for advanced lithography

Maki Tanaka, Jeroen Meessen, Chie Shishido, Kenji Watanabe, Ingrid Minnaert-Janssen, Peter Vanoppen

Proceedings Volume 6922, 69221T (2008) https://doi.org/10.1117/12.772088

KEYWORDS: Scanning electron microscopy, Atomic force microscopy, Calibration, Critical dimension metrology, Lithography, Image processing, Monte Carlo methods, Model-based design, Mathematical modeling, Gaussian filters

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Proceedings Article | 5 April 2007 Paper

CD-bias evaluation and reduction in CD-SEM linewidth measurements

Maki Tanaka, Chie Shishido, Wataru Nagatomo, Kenji Watanabe

Proceedings Volume 6518, 651848 (2007) https://doi.org/10.1117/12.710803

KEYWORDS: Line edge roughness, Scanning electron microscopy, Monte Carlo methods, Detection and tracking algorithms, Smoothing, Image processing, Signal to noise ratio, Model-based design, Edge detection, Electron beams

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Proceedings Article | 24 March 2006 Paper

Image resolution monitoring technique for CD-SEM

Mayuka Oosaki, Chie Shishido, Hiroki Kawada, Robert Steffen

Proceedings Volume 6152, 615243 (2006) https://doi.org/10.1117/12.655982

KEYWORDS: Image resolution, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Spatial frequencies, Correlation function, Spatial resolution, Interference (communication), Fourier transforms, Process control

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Proceedings Article | 24 May 2004 Paper

MPPC technique for gate etch process monitoring using CD-SEM images and its validity verification

Maki Tanaka, Chie Shishido, Yuji Takagi, Hidetoshi Morokuma

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536284

KEYWORDS: Semiconducting wafers, Atomic force microscopy, Scanning electron microscopy, Transistors, 3D metrology, Etching, Process control, Image processing, Control systems, Monte Carlo methods

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Proceedings Article | 2 June 2003 Paper

Cross-sectional gate feature identification method using top-down SEM images

Maki Tanaka, Chie Shishido, Yuji Takagi, Hidetoshi Morokuma, Osamu Komuro, Hiroyoshi Mori

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483685

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Etching, Process control, Algorithm development, Critical dimension metrology, 3D metrology, Monte Carlo methods, Metrology, Control systems

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Proceedings Article | 2 June 2003 Paper

Dose and focus estimation using top-down SEM images

Chie Shishido, Ryo Nakagaki, Maki Tanaka, Yuji Takagi, Hidetoshi Morokuma, Osamu Komuro, Hiroyoshi Mori

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483673

KEYWORDS: Data modeling, Photoresist materials, Scanning electron microscopy, Error analysis, Semiconducting wafers, Finite element methods, Optical lithography, Image processing, Tolerancing, Semiconductors

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Proceedings Article | 16 July 2002 Paper

Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images

Chie Shishido, Yuji Takagi, Maki Tanaka, Osamu Komuro, Hidetoshi Morokuma, Katsuhiro Sasada

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473507

KEYWORDS: Lithography, Scanning electron microscopy, Photoresist materials, Semiconductors, Image processing, Finite element methods, Critical dimension metrology, Semiconducting wafers, Feature extraction, Optical simulations

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Showing 5 of 18 publications

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