Mr. Chien-Ming Wang Profile

Chien-Ming Wang

Senior Manager at ASML

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Author

Publications (6)

Proceedings Article | 14 March 2006 Paper

Full-chip lithography manufacturability check for yield improvement

Yongfa Huang, Edward Tseng, Benjamin Szu-Min Lin, Chun Chi Yu, Chien-Ming Wang, Hua-Yu Liu

Proceedings Volume 6156, 61560W (2006) https://doi.org/10.1117/12.656401

KEYWORDS: Process modeling, Finite element methods, Semiconducting wafers, Data modeling, Photomasks, Lithography, Manufacturing, Calibration, Photoresist processing, Inspection

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Proceedings Article | 14 September 2001 Paper

Patterning 80-nm gates using 248-nm lithography: an approach for 0.13-um VLSI manufacturing

Chien-Ming Wang, Chien-Wen Lai, Jason Huang, Hua-Yu Liu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435745

KEYWORDS: Photomasks, Semiconducting wafers, Binary data, Optical lithography, Lithography, Manufacturing, Phase shifts, Critical dimension metrology, Very large scale integration, Reticles

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Proceedings Article | 30 December 1999 Paper

High-transmission PSM inspection sensitivity

Chunhung Wu, David Wang, Chien-Ming Wang, Li-Jui Chen, Shuo-Yen Chou, Clare Wu, Nathan Schumann, Reuven Falah, Wolfgang Staud

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373307

KEYWORDS: Inspection, Scattering, Optical proximity correction, Photomasks, Transmittance, Reticles, Glasses, Binary data, Critical dimension metrology, Phase shifts

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Proceedings Article | 26 July 1999 Paper

Customized off-axis illumination aperture filtering for sub-0.18-um KrF lithography

Chin Hsia, Tsai-Sheng Gau, Chuen-Huei Yang, Ru-Gun Liu, ChungHsing Chang, Li-Jui Chen, Chien-Ming Wang, J. Fung Chen, Bruce Smith, Gue-Wuu Hwang, JiannWen Lay, Dong-Yuan Goang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354354

KEYWORDS: Optical proximity correction, Lithographic illumination, Optical filters, Resolution enhancement technologies, Electroluminescence, Lithography, Optical lithography, Photomasks, Modulation, Calcium

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Proceedings Article | 26 July 1999 Paper

Antireflection strategies for sub-0.18-um dual-damascene structure patterning in KrF 248-nm lithography

Shuo-Yen Chou, Chien-Ming Wang, Chin Hsia, Li-Jui Chen, Gue-Wuu Hwang, Shyh-Dar Lee, Jen-Chung Lou

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354410

KEYWORDS: Reflectivity, Critical dimension metrology, Oxides, Semiconducting wafers, Refractive index, Optical lithography, Lithography, Photoresist materials, Dielectrics, Silicon

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Proceedings Article | 29 June 1998 Paper

Strategy for manipulating the optical proximity effect by postexposure bake processing

Tsai-Sheng Gau, Chien-Ming Wang, Chang-Ming Dai

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310823

KEYWORDS: Deep ultraviolet, Optical proximity correction, Resolution enhancement technologies, Lithography, Critical dimension metrology, Lithographic illumination, Chlorine, Phase shifting, Optical calibration, Reticles

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Showing 5 of 6 publications

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