A particle size measurement method based on micro-vision technology to improve the measuring precision is proposed in this paper. Firstly, the center point of the shape is determined by a single regular geometric boundary, and a corresponding spatial coordinate system is established. Secondly, by establishing a geometric shape size calibration model, the pixel size of basic parameters such as length, width, and cross-sectional area of the geometric shape is determined. Then, using autonomous motion calibration method, the pixel equivalent at the current image magnification is calibrated to reflect the correspondence between the pixel size of the image and the actual size, thereby expressing the actual size of the geometric shape. Finally, principal component analysis was used to compare, classify, and statistically analyze the measured geometric dimensions, eliminate duplicate values, reduce misidentification rates, and achieve accurate determination of geometric dimensions. In order to verify the validity of the method, repeat 5 times to measure the particle size of 100 nm, the experimental results show that the mean value ± standard deviation is consistent with the theoretical value. Therefore, this method reveals the possibility of high-precision measurement of particle size through computer micro-vision, and makes it be a much better option to be employed for further micro-nano structures analysis applications.
This paper develops a metrological atomic force microscopy system for nanoscale grid pitch characterization. Firstly, the principle of metrological atomic force microscopy and the roughness measurement method are introduced. Second, analyzed the evaluation principle of micro nano feature structures, mainly analyzed the evaluation algorithm of grid pitch, and developed an evaluation program using MATLAB. Then multiple methods are applied to measure grid pitch, and an evaluation program was developed using MATLAB to evaluate and calculate the measurement data, verifying the feasibility and reliability of each evaluation algorithm. Finally, the same grid pitch is compared and measured using metrological AFM and white light interferometer. The results show that the average measurement value is 200.14 nm, the standard deviation is 0.20 nm, and the difference is within the allowable error range. In addition, the metrological atomic force microscopy measurement method has the characteristics of high measurement accuracy, small measurement range, slow speed and no requirement for material, which provides technical support for process personnel how to choose the measurement scheme.
KEYWORDS: Film thickness, Thin films, Scanning electron microscopy, Ellipsometry, Electron microscopes, Nanofilms, Reflection, Systems modeling, Dispersion, Mathematical modeling
In this paper, ellipsometer combined with scanning electron microscope for solving the complex refractive index of nano film is proposed. Firstly, the interface of the nano film was measured using scanning electron microscope to obtain its thickness. Next, measure the parameters of the ellipsometer to establish the corresponding mathematical model and obtain the characteristic parameters of the thin film. Then, optimize the ellipsoidal mathematical model by comparing the film thickness obtained by scanning electron microscopy with that obtained by ellipsometry. Ultimately obtaining accurate film thickness and optical constants. The results show that the relative error of the calculation result of the optical properties is less than 1.0 nm and the measured values of optical constants are also consistent with the theoretical values. At the same time, the results derived from our method are in better agreement with the standard value, which shows that the measurement results are true and effective. Therefore, this method reveals the possibility of high-precision measurement of nano film through ellipsometer and scanning electron microscope, and makes it be a much better option to be employed for further micro-nano structures analysis applications.
In this paper, the impacts of surface plasmon resonance (SPR) on the angular spin splitting of light are investigated theoretically. The expression for the angular spin splitting shifts is derived, and the angular shifts as the function of the angle of incidence under different metal film thicknesses are calculated. The simulation results manifest that the angular spin splitting is significantly enhanced when surface plasmons are strongly excited. Under the optimal parameter conditions, the largest angular shift is up to 4.493×10-5 rad. It is also found that the directions of spatial propagation of photons in the out-of-plane can be switched by adjusting the angle of incidence under certain conditions. These findings may provide a new way for photon manipulation and open another possibility for the development of new nano-photonic devices.
In this letter, we theoretically investigate the impact of the incident light polarization on photonic spin splitting induced by the photonic spin Hall effect when a linearly polarized Gaussian beam is reflected from an air-glass interface around the Brewster angle. We calculate the spin splitting shift as a function of the incident light polarization under different incident angles. We find that a tiny variation of the incident light polarization can result in a dramatic change of the spin splitting shift, and the highest sensitivity is up to 6.8 μm/deg . The largest splitting shift can reach 5.3 μm, which is larger than the previously reported values. We also find that the direction of spin accumulation of photons with different spin directions can be switched by adjusting the incident angle around the Brewster angle when the incident light polarization is near the p-polarization. These findings may be useful for precise polarization metrology and photon modulation.
A mathematic model based on surface plasmon resonance (SPR) effect is presented to measure the nano metallic film
thickness with the coupling device of Kretschmann configuration composed of K9 prism-gold film-air. Four modulation
modes of SPR method, such as intensity, phase, wavelength and angle, are numerically analyzed. Their detection
principles, the measurement range and sensitivity of different modulation type sensors are discussed. The simulation
results show that the SPR intensity detection method has the highest measurement range and the SPR phase detection
method has the highest sensitivity. In practical applications, not only the measurement range and sensitivity, but the
optical signal processing mode, experiment devices, the complexity of the algorithm and cost factors should be
considered to research and develop the appropriate thin metallic film's thickness measurement SPR sensor with higher
sensitivity and stability.
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