Dr. Christian Beurgel Profile

Dr. Christian Beurgel

at Advanced Mask Technology Ctr. GmbH Co. KG

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Publications (1)

Proceedings Article | 21 November 2023 Presentation + Paper

Mask error and its contribution to OPC model error for an EUV via layer

Adam Lyons, Tom Wallow, Chris Spence, Bríd Connolly, Christian Beurgel, Markus Bender

Proceedings Volume 12750, 127500E (2023) https://doi.org/10.1117/12.2687699

KEYWORDS: Optical proximity correction, Semiconducting wafers, Extreme ultraviolet, Data modeling, Calibration, Metrology, Finite element methods, Critical dimension metrology, Contour modeling, Computer simulations

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